Search results for "Remote Plasma Sources"

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Remote Plasma Sources

Remote plasma source solutions from Advanced Energy equip your manufacturing and abatement processes with high functionality and exceptional reliability.

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MAXstream Remote Plasma Source Video

Learn how our new reliable, high-performing remote plasma source for chamber clean applications works. 

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Chamber Cleaning with Advanced Energy Remote Plasma Sources

In this video, learn how Advanced Energy's MAXstream remote plasma source (RPS) is used in CVD chamber cleaning. Extending AE’s leadership in process power, MAXstream delivers reliable performance across a broad range of flow rates, increasing productivity in semiconductor process equipment.

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MAXstream

Reliable, High-Performance Remote Plasma Source for Chamber Clean Applications

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Rapid OX

Ideal Remote Plasma Source for Oxygen-Based Processes

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Xstream

High-Quality, Chamber-Clean Remote Plasma Source with Unrivaled Performance

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Rapid OX RPS Data Sheet

Rapid OX is the ideal remote plasma source for oxygen-based processes.

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Xstream RPS Data Sheet

Xstream remote plasma source has an active matching network fully integrated plasma source platform for high-flow and high-pressure, reactive-gas processes.

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MAXStream 600, 800, 1000, and 1200 Data Sheet

The MAXstream 600, 800, 1000, and 1200 are reliable and cost-effective remote plasma source (RPS) solutions for mid-flow (6 to 12 SLPM) NF3 chamber clean applications.

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MAXstream 300 Data Sheet

The MAXstream 300 is a compact, reliable, and cost-effective remote plasma source (RPS) solution for low flow (2 to 3 SLPM) NF3 chamber clean applications.

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You may now view any resource on the Advanced Energy site. Click the button below to view your requested resource.